Nanocharacterization and Fabrication Instrumentation
Atomic Force Microscopy
The AFM at the Center is a Veeco MultiMode scanning probe microscope (SPM). This Veeco nanoscope has both contact and tapping mode as well as scanning tunneling microscopy capabilities. The image below (Au on HOPG, 10 micron x 10 micron image) was obtained by summer REU students.
Scanning Electron Microscopy
A Zeiss Sigma VP Field Emission Scanning Electron Microscope (FE-SEM) with an Oxford Instruments energy dispersive X-ray spectrometer (EDS) X-Max 80^2. The FE-SEM is equipped with an in-lens SE2 detector, a back-scatter detector, and STEM detector in addition to the standard Everhart-Thornley SE2 detector. It can be run in low pressure mode with a cathodouminescence detector for imaging of non-conductive samples.
A Hitachi TM-1000 table top SEM was acquired through a grant from the Connecticut Office of Workforce Competitiveness. This instrument operates at 15 kV and operates in either standard or charge reduction mode. Images are obtained using a backscatter detector. Reduced vacuum requirements allow for minimal specimen preparation. The instrument is outfitted with an analytical drift detector for energy dispersive X-ray spectrometry (EDS, Oxford Instruments) with no liquid nitrogen requirement.This SEM is used for research (e.g. REU and RET programs) as well as educational outreach with the "Seeing is Believing" Initiative.
Transmission Electron Microscopy
A 120kV Philips EM-400 with a Gatan 794 CCD digital camera enable users to capture and analyze data from the TEM at its resolution limit of 0.4 nm.
TEM Specimen Preparation
Proper specimen preparation is key to success in high-resolution transmission electron microscopy. The ConnSCU-CNT has several instruments to achieve reliable, reproducible and artifact-free TEM samples. A Gentle Mill provides low voltage, low angle, argon ion milling designed to minimize ion beam damage.
Two Allied High Tech Polishing systems (a MultiPrep and a TechPrep) are used for preparation
of TEM wedge cross-sections or flat polished samples.
A NanoInk, Inc. NLP 2000 is used to create arrays of micro- or nanodots in programmable patterns on a variety of substrates. Several different types of "ink" can be used. Currently students are fabricating arrays of nanodots using dispersions of metal nanoparticles.
A Nanotech Innovations, Inc. SSP-354 is used to make carbon nanotubes using a chemical vapor deposition (CVD) process.
Other equipment at the center includes:
SPI Gold Sputter Coater
Allied High Tech, Inc. Techcut-4 wafering saw
Zeiss Axiolab A.1 Optical Microscope
Olympus Inverted Optical Microscope
Olympus BH-2 metallurgical microscope
Sorvall Ultra-Microtome, MT-2
Information on our instrumentation is also located on the CRISP MRSEC webpage.
Partial Funding by NSF MRSEC DMR 1119826 • DOE DE-SC0005904 & DOE DE-SC0005072